Lam Research and JSR Corporation Collaborate on Semiconductor Manufacturing

Lam Research and JSR Corporation have announced a non-exclusive cross-licensing and collaboration agreement to enhance semiconductor manufacturing, announced in a press release. This partnership aims to accelerate the industry's transition to next-generation patterning technologies, including dry resist technology for extreme ultraviolet (EUV) lithography.

The collaboration will integrate JSR/Inpria's patterning resists and films with Lam's etch and dry resist deposition technologies. The companies will focus on developing next-generation materials for atomic layer etching and deposition processes, supporting chipmakers as they scale in the AI era.

Additionally, the agreement includes the dismissal of all claims in the litigation between Inpria and Lam Research, further solidifying their collaborative efforts in advancing semiconductor technology.